JPH0260233U - - Google Patents
Info
- Publication number
- JPH0260233U JPH0260233U JP14017288U JP14017288U JPH0260233U JP H0260233 U JPH0260233 U JP H0260233U JP 14017288 U JP14017288 U JP 14017288U JP 14017288 U JP14017288 U JP 14017288U JP H0260233 U JPH0260233 U JP H0260233U
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- plasma etching
- porous body
- etching apparatus
- lower electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001020 plasma etching Methods 0.000 claims description 14
- 239000000758 substrate Substances 0.000 claims description 4
- 239000004020 conductor Substances 0.000 claims 1
- 230000007797 corrosion Effects 0.000 claims 1
- 238000005260 corrosion Methods 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 239000002245 particle Substances 0.000 claims 1
- 238000005530 etching Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14017288U JPH0260233U (en]) | 1988-10-27 | 1988-10-27 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14017288U JPH0260233U (en]) | 1988-10-27 | 1988-10-27 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0260233U true JPH0260233U (en]) | 1990-05-02 |
Family
ID=31404105
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14017288U Pending JPH0260233U (en]) | 1988-10-27 | 1988-10-27 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0260233U (en]) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5740202A (en) * | 1980-08-22 | 1982-03-05 | Nippon Telegr & Teleph Corp <Ntt> | Removing method of primary coating of optical fiber core |
JPS63162588A (ja) * | 1986-12-25 | 1988-07-06 | 京セラ株式会社 | 導電性多孔質炭化珪素焼結体並びにその製造方法 |
-
1988
- 1988-10-27 JP JP14017288U patent/JPH0260233U/ja active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5740202A (en) * | 1980-08-22 | 1982-03-05 | Nippon Telegr & Teleph Corp <Ntt> | Removing method of primary coating of optical fiber core |
JPS63162588A (ja) * | 1986-12-25 | 1988-07-06 | 京セラ株式会社 | 導電性多孔質炭化珪素焼結体並びにその製造方法 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS56105482A (en) | Plasma etching device | |
JPS5684476A (en) | Etching method of gas plasma | |
JPS5687667A (en) | Reactive ion etching method | |
JPH0260233U (en]) | ||
JPS52143976A (en) | Dialysi s equipment | |
JPH0469465U (en]) | ||
JPS57202733A (en) | Dry etching device | |
JPS57105608A (en) | Atomizer | |
JPS62148570U (en]) | ||
JPS6240829U (en]) | ||
JPS60118236U (ja) | プラズマエツチング装置用電極 | |
JPH0283017U (en]) | ||
JPS63153526U (en]) | ||
JPS6192052U (en]) | ||
JPS56135934A (en) | Dry etching device | |
JPS6274338U (en]) | ||
JPS6073233U (ja) | ドライエツチング装置 | |
JPS61136537U (en]) | ||
JPS63173397U (en]) | ||
JPH031965U (en]) | ||
JPS6351436U (en]) | ||
JPS5740932A (en) | Device for plasma processing | |
JPH0313733U (en]) | ||
JPS62110264U (en]) | ||
JPS62129061U (en]) |